Description
|
Specification |
Machine Model: | 2244i |
Lens Type (Resolution) | 0.65 um |
Lens NA | 0.365 |
Lens Matching Ref | 200 nm |
Aperture Sizes | 25.2 x 44 mm |
Field Size | 25.2 x 44 mm |
Crossmask Size | 150 um |
Wafer Size | 6 inch |
Reticle Size | 5x5 inch |
Chamber Type, Power and Frequency Stainless UD 60 | Please see the attached picture |
Specs Test Results | |
Description | Specification |
Lens Distortion | < 200 nm |
DOF 0.65 um | ≧ 2 µm |
CD Uniformity | £ 10 % |
Wafer plane irradiance 1000W (i-line) | > 600 mW/cm2 |
(Depend on machine condition) | |
Exposure uniformity | £ 2 % |
Throughput @ 100mJ/cm^2, 5 point EGA, 90% wafer coverage | > 80 WPH |
Day 1 Day 2 | |
EGA (WAS) alignment X | 3 sigma < 150 nm |
EGA (WAS) alignment Y | 3 sigma < 150 nm |
EGA (MVS) alignment X | No assigned |
EGA (MVS) alignment Y | No assigned |