2244i

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Description	Specification
Machine Model:	2244i
Lens Type (Resolution)	0.65 um
Lens NA	0.365
Lens Matching Ref	200 nm
Aperture Sizes	25.2 x 44 mm
Field Size	25.2 x 44 mm
Crossmask Size	150 um
Wafer Size	6 inch
Reticle Size	5x5 inch
Chamber Type, Power and Frequency Stainless UD 60	Please see the attached picture
Specs Test Results
Description	Specification
Lens Distortion	< 200 nm
DOF 0.65 um	≧ 2 µm
CD Uniformity	£ 10 %
Wafer plane irradiance 1000W (i-line)	> 600 mW/cm2
Wafer plane irradiance 1000W (i-line)	(Depend on machine condition)
Exposure uniformity	£ 2 %
Throughput @ 100mJ/cm^2, 5 point EGA, 90% wafer coverage	> 80 WPH
Day 1 Day 2
EGA (WAS) alignment X	3 sigma < 150 nm
EGA (WAS) alignment Y	3 sigma < 150 nm
EGA (MVS) alignment X	No assigned
EGA (MVS) alignment Y	No assigned